RCD diamond slurry takes GRISH own RCD powder as raw materials. With polydisperse formula, it can keep high and uniform removal rate and not easy to produce scratches. RCD diamond slurry is mainly used in grinding and polishing of sapphire material, optical lens, hard glass and crystal, superhard ceramic and alloy material etc.
Grish colloidal silica slurries are produced by high purity silicon powder through advanced technology. They are widely used for nanometer scale chemical mechanical polishing in a variety of materials such as silicon wafer, chemical combination of crystals, precise optics, gemstones etc.
GRISH lubricants can be mixed with abrasive materials such as diamond powder, which can achieve good dispersion and suspension effect, improve abrasive grinding force, achieve excellent grinding and processing effect. It is environmentally-friendly and easy to be cleaned. Customizations are available upon the requirements, and it will be more convenient for customers to use.
MD diamond slurry is our most cost effective solution to hard lapping such as ceramic, cast iron, metal material, optical crystal etc. It is with good dispensability, uniformly particle size distribution, both water and oil based are available, widely used for the hard materials lapping and processing.
GRISH Polycrystalline Diamond Slurry formulated with PCD Powder and water/oil soluble carrier liquids to maximize cutting and polishing efficiency. PCD Slurry provides high removal rate, less scratches, stable grinding rate and uniform polishing surface. We can also customize slurry as per specific requirement by customers.
GRISH has corresponding polishing processes and consumables for compound semiconductors, including silicon carbide, aluminum nitride, gallium nitride, gallium arsenide, indium phosphide, etc., and also undertakes various types of OEM services.
GRISH CMP slurry takes colloidal as raw material. With unique formulas design according to different polishing materials, our slurry can ensure the pH value almost unchanged during polishing, thus to ensure the stability of polishing rate and save polishing time. GRISH CMP polishing slurry is widely used for variety of nanoscale material's chemical mechanical polishing. Such as sapphire material, silicon, stainless steel, aluminum magnesium alloy, compound crystal, etc.
